Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist

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作者：
Farhoud, Maya
Ferrera, Juan
Lochtefeld, Anthony J.
Murphy, T.E.
Schattenburg, Mark L.
Carter, J.
Ross, C.A.
Smith, Henry I.
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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | / 17卷
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页码：3182 / 3185
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