Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist

被引：0
|
作者：
Farhoud, Maya
Ferrera, Juan
Lochtefeld, Anthony J.
Murphy, T.E.
Schattenburg, Mark L.
Carter, J.
Ross, C.A.
Smith, Henry I.
机构：
来源：
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | / 17卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：3182 / 3185
相关论文
共 50 条
  • [21] Fabrication of 3 nm wires using 100 keV electron beam lithography and poly(methyl methacrylate) resist
    Cumming, DRS
    Thoms, S
    Beaumont, SP
    Weaver, JMR
    APPLIED PHYSICS LETTERS, 1996, 68 (03) : 322 - 324
  • [22] Sub-50 nm period patterns with EUV interference lithography
    Solak, HH
    David, C
    Gobrecht, J
    Golovkina, V
    Cerrina, F
    Kim, SO
    Nealey, PF
    MICROELECTRONIC ENGINEERING, 2003, 67-8 : 56 - 62
  • [23] Fabrication of trilayer resist using photocuring-imprint lithography
    Kim, SH
    Hiroshima, H
    Inoue, S
    Kurashima, Y
    Komuro, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 3144 - 3148
  • [24] Fabrication of metal nano-wires by laser interference lithography using a tri-layer resist process
    Yutao Fang
    Longgui Dai
    Fan Yang
    Gen Yue
    Peng Zuo
    Hong Chen
    Optical and Quantum Electronics, 2016, 48
  • [25] Fabrication of metal nano-wires by laser interference lithography using a tri-layer resist process
    Fang, Yutao
    Dai, Longgui
    Yang, Fan
    Yue, Gen
    Zuo, Peng
    Chen, Hong
    OPTICAL AND QUANTUM ELECTRONICS, 2016, 48 (01) : 1 - 8
  • [26] Chemically amplified negative-tone resist using novel acryl polymer for 193nm lithography
    Hada, H
    Iwai, T
    Nakayama, T
    MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 676 - 683
  • [27] EDGE ROUGHNESS OF A 200-NM PITCH RESIST PATTERN FABRICATED BY ION PROJECTION LITHOGRAPHY
    BRUNGER, WH
    BLASCHKE, J
    TORKLER, M
    BUCHMANN, LM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2404 - 2408
  • [28] Fabrication of 200 nm peiriod x-ray transmission gratings using electron beam lithography
    Zhu, Xiaoli
    Xie, Changqing
    Ye, Tianchun
    Zhao, Min
    Ma, Jie
    Jiang, Ji
    Niu, Jiebin
    Liu, Ming
    HOLOGRAPHY AND DIFFRACTIVE OPTICS III, 2008, 6832
  • [29] Patterning at 6.5 nm Wavelength Using Interference Lithography
    Mojarad, Nassir
    Vockenhuber, Michaela
    Wang, Li
    Terhalle, Bernd
    Ekinci, Yasin
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IV, 2013, 8679
  • [30] Methods for fabricating arrays of holes using interference lithography
    Fernandez, A.
    Decker, J.Y.
    Herman, S.M.
    Phillion, D.W.
    Sweeney, D.W.
    Perry, M.D.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1997, 15 (06):
12345