Reactivity of acid generators for chemically amplified resists with low-energy electrons

被引：0
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作者：
Nakano, Atsuro [1 ]
Kozawa, Takahiro [1 ]
Tagawa, Seiichi [1 ]
Szreder, Tomasz [2 ]
Wishart, James F. [2 ]
Kai, Toshiyuki [3 ]
Shimokawa, Tsutomu [3 ]
机构：
[1] Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
[2] Chemistry Department, Brookhaven National Laboratory, Upton, NY 11973-5000, United States
[3] JSR Corp., 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1600年 / 45卷 / 4-7期
关键词：
In chemically amplified resists for ionizing radiations such as electron beams and extreme ultraviolet (EUV); low-energy electrons play an important role in the pattern formation processes. The reactivity of acid generators with low-energy electrons was evaluated using solvated electrons in tetrahydrofuran; which were generated by a pulsed electron beam. The rate constants of acid generators with the solvated electrons ranged from 0.6 to 1.9 × 10 11 M-1 s-1. © 2006 The Japan Society of Applied Physics;
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