Reactivity of Halogenated Resist Polymer with Low-Energy Electrons

被引:4
|
作者
Yamamoto, Hiroki [1 ]
Kozawa, Takahiro [1 ]
Saeki, Akinori [1 ]
Tagawa, Seiichi [1 ]
Mimura, Takeyoshi [2 ]
Yukawa, Hiroto [2 ]
Onodera, Junichi [2 ]
机构
[1] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
[2] Tokyo Ohka Kogyo Co Ltd, Kanagawa 2530114, Japan
关键词
CHEMICALLY AMPLIFIED RESISTS; SUBPICOSECOND PULSE-RADIOLYSIS; EXTREME-ULTRAVIOLET RESISTS; RADIATION-INDUCED REACTIONS; ACID GENERATION; X-RAY; OPTICAL LITHOGRAPHY; REACTION-MECHANISM; BEAM RESISTS; DEPENDENCE;
D O I
10.1143/JJAP.48.06FC09
中图分类号
O59 [应用物理学];
学科分类号
摘要
In chemically amplified resists, secondary electrons are generated upon exposure to ionizing radiations, such as extreme ultraviolet radiation and electron beam. Acid generators are decomposed mainly through their reaction with these secondary electrons after they lose their energy sufficiently. Therefore, the reaction of polymers with low-energy electrons significantly affects acid generation processes. In this study, the authors evaluated the reactivity of halogenated polymers with low-energy electrons using brominated poly(4-hydroxystyrene) and investigated the relationship between reactivity and acid yield. It was found that the decomposition of the radical anions of polymers is suppressed by >20% owing to the delocalization of excess electrons on the pi-orbital of an aromatic ring. (C) 2009 The Japan Society of Applied Physics
引用
收藏
页码:06FC091 / 06FC093
页数:3
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