Mask effects on resist variability in extreme ultraviolet lithography

被引：0
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作者：
Pret, Alessandro Vaglio [1 ]
Gronheid, Roel [1 ]
Engelen, Jan [2 ]
Yan, Pei-Yang [3 ]
Leeson, Michael J. [4 ]
Younkin, Todd R. [1 ,4 ]
Garidis, Konstantinos [5 ]
Biafore, John [6 ]
机构：
[1] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
[2] Katholieke Universiteit Leuven (K.U.Leuven), Department of Electrical Engineering, 3000 Leuven, Belgium
[3] Intel Corporation, 3065 Bowers Ave, Santa Clara, CA 95054, United States
[4] Intel Corporation, 2501 NW 229th Avenue, Hillsboro, OR 97124, United States
[5] Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden
[6] KLA-Tencor-Finle Division, Austin, TX 78759, United States
来源：
Japanese Journal of Applied Physics | 2013年 / 52卷 / 6 PART 2期
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