Mask effects on resist variability in extreme ultraviolet lithography

被引：0

作者：

Pret, Alessandro Vaglio ^{[1
]}

Gronheid, Roel ^{[1
]}

Engelen, Jan ^{[2
]}

Yan, Pei-Yang ^{[3
]}

Leeson, Michael J. ^{[4
]}

Younkin, Todd R. ^{[1
,4
]}

Garidis, Konstantinos ^{[5
]}

Biafore, John ^{[6
]}

机构：

[1] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

[2] Katholieke Universiteit Leuven (K.U.Leuven), Department of Electrical Engineering, 3000 Leuven, Belgium

[3] Intel Corporation, 3065 Bowers Ave, Santa Clara, CA 95054, United States

[4] Intel Corporation, 2501 NW 229th Avenue, Hillsboro, OR 97124, United States

[5] Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden

[6] KLA-Tencor-Finle Division, Austin, TX 78759, United States

来源：

Japanese Journal of Applied Physics | 2013年 / 52卷 / 6 PART 2期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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