Aerial image mask inspection system for extreme ultraviolet lithography

被引：0
|
作者：
Kinoshita, Hiroo [1 ,3 ]
Hamamoto, Kazuhiro [2 ,3 ]
Sakaya, Nobuyuki [2 ,3 ]
Hosoya, Morio [2 ,3 ]
Watanabe, Takeo [1 ,3 ]
机构：
[1] University of Hyogo, Kamigori, Hyogo 678-1205, Japan
[2] HOYA Corporation, Electro-Optics Company, R and D Center, Akishima, Tokyo 196-8510, Japan
[3] CREST, JST, Kawaguchi, Saitama 332-0012, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2007年 / 46卷 / 9 B期
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摘要：
Journal article (JA)
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页码：6113 / 6117
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