Mask effects on resist variability in extreme ultraviolet lithography

被引：0
|
作者：
Pret, Alessandro Vaglio [1 ]
Gronheid, Roel [1 ]
Engelen, Jan [2 ]
Yan, Pei-Yang [3 ]
Leeson, Michael J. [4 ]
Younkin, Todd R. [1 ,4 ]
Garidis, Konstantinos [5 ]
Biafore, John [6 ]
机构：
[1] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
[2] Katholieke Universiteit Leuven (K.U.Leuven), Department of Electrical Engineering, 3000 Leuven, Belgium
[3] Intel Corporation, 3065 Bowers Ave, Santa Clara, CA 95054, United States
[4] Intel Corporation, 2501 NW 229th Avenue, Hillsboro, OR 97124, United States
[5] Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden
[6] KLA-Tencor-Finle Division, Austin, TX 78759, United States
来源：
Japanese Journal of Applied Physics | 2013年 / 52卷 / 6 PART 2期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Mask Effects on Resist Variability in Extreme Ultraviolet Lithography
    Pret, Alessandro Vaglio
    Gronheid, Roel
    Engelen, Jan
    Yan, Pei-Yang
    Leeson, Michael J.
    Younkin, Todd R.
    Garidis, Konstantinos
    Biafore, John
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (06)
  • [2] Effects of mask absorber structures on the extreme ultraviolet lithography
    Seo, Hwan-Seok
    Lee, Dong-Gun
    Kim, Hoon
    Huh, Sungmin
    Ahn, Byung-Sup
    Han, Hakseung
    Kim, Dongwan
    Kim, Seong-Sue
    Cho, Han-Ku
    Gullikson, Eric M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (06): : 2208 - 2214
  • [3] Effects of multilayer mask roughness on extreme ultraviolet lithography
    Deng, YF
    Pistor, T
    Neureuther, AR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (01): : 344 - 349
  • [4] Mask technology of extreme ultraviolet lithography
    Kinoshita, H
    Watanabe, T
    Ozawa, A
    Niibe, M
    PHOTOMASK AND X-RAY MASK TECHNOLOGY V, 1998, 3412 : 358 - 368
  • [5] Rigorous simulation of mask corner effects in extreme ultraviolet lithography
    Pistor, TV
    Adam, K
    Neureuther, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3449 - 3455
  • [6] Resist material options for extreme ultraviolet lithography
    Kozawa, Takahiro
    ADVANCED OPTICAL TECHNOLOGIES, 2015, 4 (04) : 311 - 317
  • [7] Resist materials and processes for extreme ultraviolet lithography
    EUVL Infrastructure Development Center, Inc., Tsukuba, Ibaraki 305-8569, Japan
    不详
    Jpn. J. Appl. Phys., 1600, 1
  • [8] Resist Materials and Processes for Extreme Ultraviolet Lithography
    Itani, Toshiro
    Kozawa, Takahiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (01)
  • [9] Resist outgassing characteristics in extreme ultraviolet lithography
    Watanabe, T
    Hamamoto, K
    Kinoshita, H
    Hada, H
    Komano, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (6B): : 3713 - 3717
  • [10] Cr absorber mask for extreme ultraviolet lithography
    Zhang, GJ
    Yan, PY
    Liang, T
    20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 774 - 780
12345