Advanced millisecond annealing technologies and its applications and concerns on advanced logic LSI fabrication processes

被引：0
|
作者：
Fujitsu Limited, 50, Fuchigami, Akiruno, Tokyo, 197-0833, Japan [1 ]
不详 [2 ]
机构：
来源：
Mater Sci Forum | 2008年 / 325-332期
关键词：
Annealing;
D O I：
10.4028/www.scientific.net/msf.573-574.325
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Advanced LSI packaging technologies
    Hiraiwa, K
    Minamizawa, M
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 2000, 36 (01): : 99 - 107
  • [2] Advanced LSI packaging technologies
    Hiraiwa, Katsuro
    Minamizawa, Masaharu
    Fujitsu Scientific and Technical Journal, 2000, 36 (01): : 99 - 107
  • [3] Millisecond Annealing for Advanced Device Fabrications
    Wang, Yun
    Chen, Shaoyin
    Wang, Xiaoru
    Shen, Michael
    2014 20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014), 2014,
  • [4] Fabrication technologies for advanced beat transfer applications
    Grande, WJ
    FIRST INTERNATIONAL CONFERENCE ON MICROCHANNELS AND MINICHANNELS, 2003, : 215 - 222
  • [5] Precise millisecond annealing for advanced material processing
    Reichel, Denise
    Skorupa, Wolfgang
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 9, NO 10-11, 2012, 9 (10-11): : 2045 - 2049
  • [6] Advanced (Millisecond) Annealing in Silicon Based Semiconductor Manufacturing
    Govindaraju, S.
    Shih, C. -L.
    Ramanarayanan, P.
    Lin, Y. -H.
    Knutson, K.
    ADVANCED GATE STACK, SOURCE/DRAIN, AND CHANNEL ENGINEERING FOR SI-BASED CMOS 6: NEW MATERIALS, PROCESSES, AND EQUIPMENT, 2010, 28 (01): : 81 - 90
  • [7] Simulation of pattern effect induced by millisecond annealing used in advanced metal-oxide-semiconductor technologies
    Cacho, F.
    Bono, H.
    Beneyton, R.
    Dumont, B.
    Colin, A.
    Morin, P.
    JOURNAL OF APPLIED PHYSICS, 2010, 108 (01)
  • [8] Advanced Processes in Metallurgical Technologies
    Saternus, Mariola
    Socha, Ladislav
    METALS, 2024, 14 (09)
  • [9] Fuzzy logic and evaluation of advanced technologies
    Ordoobadi, Sharon M.
    INDUSTRIAL MANAGEMENT & DATA SYSTEMS, 2008, 108 (07) : 928 - 946
  • [10] Advanced MOS Device Technology for Low Power Logic LSI
    Takagi, Shinichi
    Kato, Kimihiko
    Sumita, Kei
    Jo, Kwangwon
    Lim, Cheol-Min
    Takaguchi, Ryotaro
    Ahn, Dae-Hwan
    Takeyasu, Jun
    Toprasertpong, Kasidit
    Takenaka, Mitsuru
    PROCEEDINGS OF THE 2019 26TH INTERNATIONAL CONFERENCE MIXED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS (MIXDES 2019), 2019, : 26 - 33
12345