共 50 条
- [42] Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2018, 36 (01):
- [43] Microwave plasma chemical vapour deposition of tetramethylsilane:: correlations between optical emission spectroscopy and film characteristics SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 314 - 320
- [44] Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (03):
- [48] Modeling and filtering of optical emission spectroscopy data for plasma etching systems PROCEEDINGS OF THE 1997 AMERICAN CONTROL CONFERENCE, VOLS 1-6, 1997, : 627 - 628
- [49] Modeling and filtering of optical emission spectroscopy data for plasma etching systems 1997 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING CONFERENCE PROCEEDINGS, 1997, : B41 - B44
- [50] Correlation between the TiCN deposition and the optical emission spectroscopy in an arc plasma reactor Vide, 284 (213-218):