Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system

被引：0
|
作者：
School of Electrical and Electronic Engineering, Yonsei University, Seoul [1 ]
120-749, Korea, Republic of
机构：
来源：
ICEP-IAAC - Int. Conf. Electron. Packag. iMAPS All Asia Conf. | / 638-641期
关键词：
Engineering Village;
D O I：
7111092
中图分类号：
学科分类号：
摘要：
Analytic modeling - Body Tube component - Detection capability - Manufacturability - Optical emission spectroscopies (OES) - Plasma assisted atomic layer depositions - Plasma characteristics - Plasma uniformity
引用
收藏
相关论文
共 50 条
  • [21] Optical emission spectroscopy of lead sulfide films plasma deposition
    Mochalov, Leonid
    Dorosz, Dominik
    Kochanowicz, Marcin
    Logunov, Alexander
    Letnianchik, Aleksey
    Starostin, Nikolay
    Zelentsov, Sergey
    Boreman, Glenn
    Vorotyntsev, Vladimir
    Spectrochimica Acta - Part A: Molecular and Biomolecular Spectroscopy, 2020, 241
  • [22] Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
    Profijt, H. B.
    Potts, S. E.
    van de Sanden, M. C. M.
    Kessels, W. M. M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2011, 29 (05):
  • [23] Research on atomic layer deposition of alumina thin film with plasma assisted
    Sang, Lijun
    Zhao, Qiaoqiao
    Hu, Zhaoli
    Li, Xingcun
    Lei, Wenwen
    Chen, Qiang
    Gaodianya Jishu/High Voltage Engineering, 2012, 38 (07): : 1731 - 1735
  • [24] Ion Bombardment during Plasma-Assisted Atomic Layer Deposition
    Profijt, H. B.
    Kessels, W. M. M.
    ATOMIC LAYER DEPOSITION APPLICATIONS 8, 2012, 50 (13): : 23 - 34
  • [25] Surface modification of polymers by plasma-assisted atomic layer deposition
    Kaariainen, T. O.
    Lehti, S.
    Kaariainen, M. -L.
    Cameron, D. C.
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S475 - S479
  • [26] Plasma-assisted atomic layer deposition of transition metals and their carbides
    Guo Z.
    Wang X.
    Zhongguo Kexue Jishu Kexue/Scientia Sinica Technologica, 2021, 51 (06): : 637 - 647
  • [27] Low-temperature deposition of TiN by plasma-assisted atomic layer deposition
    Heil, S. B. S.
    Langereis, E.
    Roozeboom, F.
    van de Sanden, M. C. M.
    Kessels, W. M. M.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (11) : G956 - G965
  • [28] Microscopic modeling and optimal operation of plasma enhanced atomic layer deposition
    Ding, Yangyao
    Zhang, Yichi
    Orkoulas, Gerassimos
    Christofides, Panagiotis D.
    CHEMICAL ENGINEERING RESEARCH & DESIGN, 2020, 159 : 439 - 454
  • [29] Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
    Karwal, S.
    Williams, B. L.
    Niemela, J. -P.
    Verheijen, M. A.
    Kessels, W. M. M.
    Creatore, M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (01):
  • [30] Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition
    Tinck, S.
    Bogaerts, A.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (01):
12345