Growth of zno thin films on silicon substrates by atomic layer deposition

被引：4
|
作者：
Hussin, Rosniza [1 ,2 ]
Hou, Xianghui [1 ]
Choy, Kwang-Leong [1 ]
机构：
[1] Energy and Sustainability Research Division, Department Materials and Manufacturing Engineering, University of Nottingham NG7 2RD, United Kingdom
[2] University Tun Hussein Onn Malaysia (UTHM) 86400, Parit Raja Batu Pahat, Johor, Malaysia
来源：
Defect and Diffusion Forum | 2012年 / 329卷
关键词：
II-VI semiconductors - Semiconducting zinc compounds - Crystal atomic structure - Magnetic semiconductors - Oxide films - Substrates - Deionized water - Silicon wafers - Metallic films - Oxide semiconductors - Thin films - Atomic force microscopy - Atomic layer deposition - Film growth - Wide band gap semiconductors - Zinc sulfide;
D O I：
10.4028/www.scientific.net/DDF.329.159
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：159 / 164
相关论文
共 50 条
  • [31] Fabrication of Nitride Thin Films on Si Substrates by Atomic Layer Deposition Technique
    Ogawa, Shumpei
    Kuroda, Tatsuya
    Koike, Ryuga
    Ishizaki, Hiroki
    MRS ADVANCES, 2018, 3 (03): : 165 - 170
  • [32] Epitaxial growth of highly textured ZnO thin films on Si using an AlN buffer layer by atomic layer deposition
    Kolhep, Maximilian
    Sun, Cheng
    Blaesing, Juergen
    Christian, Bjoern
    Zacharias, Margit
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (03):
  • [33] Atomic layer deposition of ZnO:Al on PAA substrates
    Blagoev, B. S.
    Vlakhov, E.
    Videkov, V.
    Tzaneva, B.
    Luka, G.
    Witkowski, B. S.
    Terziyska, P.
    Leclercq, J.
    Krajewski, T. A.
    Guziewicz, E.
    Dimitrov, D. Z.
    Mehandzhiev, V. B.
    Sveshtarov, P.
    INERA CONFERENCE: VAPOR PHASE TECHNOLOGIES FOR METAL OXIDE AND CARBON NANOSTRUCTURES, 2016, 764
  • [34] Tunable optical properties in atomic layer deposition grown ZnO thin films
    Pal, Dipayan
    Mathur, Aakash
    Singh, Ajaib
    Singhal, Jaya
    Sengupta, Amartya
    Dutta, Surjendu
    Zollner, Stefan
    Chattopadhyay, Sudeshna
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (01):
  • [35] Atomic layer deposition and characterization of Ga-doped ZnO thin films
    Saito, K.
    Hiratsuka, Y.
    Omata, A.
    Makino, H.
    Kishimoto, S.
    Yamamoto, T.
    Horiuchi, N.
    Hirayama, H.
    SUPERLATTICES AND MICROSTRUCTURES, 2007, 42 (1-6) : 172 - 175
  • [36] ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
    Kawamura, Yumi
    Hattori, Nozomu
    Miyatake, Naomasa
    Horita, Masahiro
    Uraoka, Yukiharu
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (04)
  • [37] Immobilization of ZnO thin films onto fibrous glass substrates via atomic layer deposition and investigation of photocatalytic activity
    Islam, Shafiqul
    Akyildiz, Halil, I
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2021, 32 (22) : 27027 - 27043
  • [38] Immobilization of ZnO thin films onto fibrous glass substrates via atomic layer deposition and investigation of photocatalytic activity
    Shafiqul Islam
    Halil I. Akyildiz
    Journal of Materials Science: Materials in Electronics, 2021, 32 : 27027 - 27043
  • [39] Nanoindentation-induced interfacial fracture of ZnO thin films deposited on Si(111) substrates by atomic layer deposition
    Jian, Sheng-Rui
    Lee, Ya-Hui
    JOURNAL OF ALLOYS AND COMPOUNDS, 2014, 587 : 313 - 317
  • [40] Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates
    Strehle, Steffen
    Schmidt, Daniela
    Albert, Matthias
    Bartha, Johann W.
    CHEMICAL VAPOR DEPOSITION, 2011, 17 (1-3) : 37 - 44
12345