Growth of zno thin films on silicon substrates by atomic layer deposition

被引：4
|
作者：
Hussin, Rosniza [1 ,2 ]
Hou, Xianghui [1 ]
Choy, Kwang-Leong [1 ]
机构：
[1] Energy and Sustainability Research Division, Department Materials and Manufacturing Engineering, University of Nottingham NG7 2RD, United Kingdom
[2] University Tun Hussein Onn Malaysia (UTHM) 86400, Parit Raja Batu Pahat, Johor, Malaysia
来源：
Defect and Diffusion Forum | 2012年 / 329卷
关键词：
II-VI semiconductors - Semiconducting zinc compounds - Crystal atomic structure - Magnetic semiconductors - Oxide films - Substrates - Deionized water - Silicon wafers - Metallic films - Oxide semiconductors - Thin films - Atomic force microscopy - Atomic layer deposition - Film growth - Wide band gap semiconductors - Zinc sulfide;
D O I：
10.4028/www.scientific.net/DDF.329.159
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：159 / 164
相关论文
共 50 条
  • [41] Two-step growth of ZnO filins on silicon by atomic layer deposition
    Lee, S
    Im, YH
    Hahn, YB
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2005, 22 (02) : 334 - 338
  • [42] Investigations into the impact of various substrates and ZnO ultra thin seed layers prepared by atomic layer deposition on growth of ZnO nanowire array
    JN Ding
    YB Liu
    CB Tan
    NY Yuan
    Nanoscale Research Letters, 7
  • [43] Investigations into the impact of various substrates and ZnO ultra thin seed layers prepared by atomic layer deposition on growth of ZnO nanowire array
    Ding, J. N.
    Liu, Y. B.
    Tan, C. B.
    Yuan, N. Y.
    NANOSCALE RESEARCH LETTERS, 2012, 7
  • [44] Effects of Buffer Layer Annealing on ZnO Thin Films Grown by using Atomic Layer Deposition
    Lee, J. Y.
    Kim, C. R.
    Heo, J. H.
    Shin, C. M.
    Park, J. H.
    Lee, T. M.
    Ryu, H.
    Chang, J. H.
    Son, C. S.
    Shin, B. C.
    Lee, W. J.
    Tan, S. T.
    Zhao, J. L.
    Sun, X. W.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 55 (06) : 2556 - 2559
  • [45] Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition
    Kim, Seong Keun
    Han, Jeong Hwan
    Kim, Gun Hwan
    Hwang, Cheol Seong
    CHEMISTRY OF MATERIALS, 2010, 22 (09) : 2850 - 2856
  • [46] Film growth model of atomic layer deposition for multicomponent thin films
    Kim, JH
    Kim, JY
    Kang, SW
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (09)
  • [47] Controlled growth of yttrium oxysulphide thin films by atomic layer deposition
    Kukli, K
    Peussa, M
    Johansson, LS
    Nykänen, E
    Niinistö, L
    RARE EARTHS '98, 1999, 315-3 : 216 - 221
  • [48] Film growth model of atomic layer deposition for multicomponent thin films
    Kim, Jin-Hyock
    Kim, Ja-Yong
    Kang, Sang-Won
    Journal of Applied Physics, 2005, 97 (09):
  • [49] Growth of (111)-textured copper thin films by atomic layer deposition
    Mane, Anil U.
    Shivashankar, S. A.
    JOURNAL OF CRYSTAL GROWTH, 2005, 275 (1-2) : E1253 - E1257
  • [50] Growth of conductive copper sulfide thin films by atomic layer deposition
    Johansson, J
    Kostamo, J
    Karppinen, M
    Niinistö, L
    JOURNAL OF MATERIALS CHEMISTRY, 2002, 12 (04) : 1022 - 1026
12345