Investigation of Helicon discharge plasma parameters in the hybrid RF plasma system

被引：0

作者：

Aleksandrov, A.F. ^{[1
]}

Petrov, A.K. ^{[1
]}

Vavilin, K.V. ^{[1
]}

Kralkina, E.A. ^{[1
]}

Neklyudova, P.A. ^{[1
]}

Nikonov, A.M. ^{[1
]}

Pavlov, V.B. ^{[1
]}

Ayrapetov, A.A. ^{[2
]}

Odinokov, V.V. ^{[2
]}

Sologub, V.A. ^{[2
]}

Pavlov, G.Ya. ^{[2
]}

机构：

[1] Physical Department of Lomonosov, Moscow State University, Build. 2, 1 Leninskie Gory, Moscow,111991, Russia

[2] Research Institute of Precision Machinery Industry, 10 Panfilovsky av., Zelenograd, Moscow,124460, Russia

来源：

Applied Physics | 2015年 / 2015-January卷 / 03期

关键词：

Discharge plasma - External magnetic field - Growth stimulation - Helicon discharge - Inductive - Ion probe - Radio frequencies - RF plasma systems;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

下载

页码：25 / 28

共 50 条

[41] RF DISCHARGE PLASMA CONDITIONS IN A PLASMA PROCESSING APPARATUS
OJHA, SM
VACUUM, 1977, 27 (02) : 65 - 67
[42] Investigation of a SF6 helicon plasma
Chabert, P
Boswell, RW
Davis, C
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (01): : 78 - 86
[43] Transition of discharge modes in an RF discharge plasma
Nakamura, M
Ohuchi, M
Kubota, T
REPORT OF RESEARCH CENTER OF ION BEAM TECHNOLOGY HOSEI UNIVERSITY, SUPPLEMENT NO.16, 1997, : 27 - 32
[44] Comparison of the B field dependency of plasma parameters of a weakly magnetized inductive and Helicon hydrogen discharge
Briefi, S.
Gutmann, P.
Rauner, D.
Fantz, U.
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (03):
[45] A MASS-SPECTROMETRIC INVESTIGATION OF THE PLASMA POLYMERIZATION OF METHYLTRIMETHOXYSILANE IN AN RF DISCHARGE
HAYS, AK
THIN SOLID FILMS, 1981, 84 (04) : 401 - 407
[46] NEW RF HELICON-PLASMA DEVICES FOR VARIOUS APPLICATIONS
Tanhawa, Takao
Shinohara, S.
Motomura, T.
Tanaka, K.
Toki, K.
Funaki, I.
STATISTICAL PHYSICS, HIGH ENERGY, CONDENSED MATTER AND MATHEMATICAL PHYSICS, 2008, : 539 - 539
[47] Collective mechanisms for the absorption of RF power in helicon plasma sources
Shamrai, KP
PLASMA PHYSICS REPORTS, 1999, 25 (11) : 860 - 866
[48] Volume and surface rf power absorption in a helicon plasma source
Shamrai, KP
Taranov, VB
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (03): : 474 - 491
[49] Volume and surface rf power absorption in a helicon plasma source
Natl Acad of Sciences, Kiev, Ukraine
Plasma Sources Sci Technol, 3 (474-491):
[50] Spatial distribution of the RF power absorbed in a helicon plasma source
Aleksenko, O. V.
Miroshnichenko, V. I.
Mordik, S. N.
PLASMA PHYSICS REPORTS, 2014, 40 (08) : 665 - 671

← 1 2 3 4 5 →