Analysis on effects of thermal treatment on structural characteristic of ion beam sputtering SiO2 films

被引：0

作者：

Ji, Yiqin ^{[1
,2
]}

Jiang, Yugang ^{[2
,3
]}

Liu, Huasong ^{[2
]}

Wang, Lishuan ^{[2
]}

Liu, Dandan ^{[2
]}

Jiang, Chenghui ^{[2
]}

Yang, Yaping ^{[3
]}

Fan, Rongwei ^{[1
]}

Chen, Deying ^{[1
]}

机构：

[1] National Key Laboratory of Science and Technology on Tunable Laser, Institute of Optical-electronics, Harbin Institute of Technology, Harbin 150080, China

[2] Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300192, China

[3] Key Laboratory of Advanced Micro-structure Materials, Department of Physics, Tongji University, Shanghai 200092, China

来源：

Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering | 2013年 / 42卷 / 02期

关键词：

10;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：418 / 422

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