ON THE MECHANISM OF SPUTTERING OF SIO2 BY AR AT ION ENERGIES NEAR THE SPUTTERING THRESHOLD

被引：18
|
作者：
TODOROV, SS
CHAKAROV, IR
机构：
来源：
VACUUM | 1989年 / 39卷 / 11-12期
关键词：
D O I：
10.1016/0042-207X(89)91099-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1101 / 1103
页数：3
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