共 50 条
- [2] Preferential sputtering of Ar ion processing SiO2 mirror [J]. 6TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: ADVANCED OPTICAL MANUFACTURING TECHNOLOGIES, 2012, 8416
- [3] O2 DISSOCIATION RATES IN O2-AR MIXTURES [J]. JOURNAL OF CHEMICAL PHYSICS, 1961, 34 (02): : 460 - &
- [4] Evaporation behavior of SiO2 in N2-O2-H2O atmospheres [J]. MATERIALS TRANSACTIONS, 2004, 45 (02) : 334 - 337
- [6] LATTICE EXCITATIONS IN O2-AR SOLID-SOLUTION [J]. FIZIKA NIZKIKH TEMPERATUR, 1992, 18 (07): : 761 - 767
- [8] OXYGEN VIBRATIONAL RELAXATION IN O2-HE AND O2-AR MIXTURES [J]. JOURNAL OF CHEMICAL PHYSICS, 1963, 39 (07): : 1807 - &
- [9] Sputtering of Spherical SiO2 Samples [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2016, 44 (06) : 1036 - 1044
- [10] REACTIVE FACET SPUTTERING OF SIO2 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (11) : 3151 - 3153