Analysis on effects of thermal treatment on structural characteristic of ion beam sputtering SiO2 films

被引：0
|
作者：
Ji, Yiqin [1 ,2 ]
Jiang, Yugang [2 ,3 ]
Liu, Huasong [2 ]
Wang, Lishuan [2 ]
Liu, Dandan [2 ]
Jiang, Chenghui [2 ]
Yang, Yaping [3 ]
Fan, Rongwei [1 ]
Chen, Deying [1 ]
机构：
[1] National Key Laboratory of Science and Technology on Tunable Laser, Institute of Optical-electronics, Harbin Institute of Technology, Harbin 150080, China
[2] Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300192, China
[3] Key Laboratory of Advanced Micro-structure Materials, Department of Physics, Tongji University, Shanghai 200092, China
来源：
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering | 2013年 / 42卷 / 02期
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页码：418 / 422
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