Growth of SiGe by D-UHV/CVD at low temperature

被引:0
|
作者
State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China [1 ]
机构
来源
Pan Tao Ti Hsueh Pao | 2008年 / 10卷 / 1889-1892期
关键词
Si-Ge alloys;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:1889 / 1892
相关论文
共 50 条
  • [41] Proton tolerance of fourth-generation 350 GHz UHV/CVD SiGe HBTs
    Sutton, AK
    Haugerud, BM
    Lu, Y
    Kuo, WML
    Cressler, JD
    Marshall, PW
    Reed, RA
    Rieh, JS
    Freeman, G
    Ahlgren, D
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2004, 51 (06) : 3736 - 3742
  • [42] Noise parameter optimization of UHV/CVD SiGe HBT's for RF and microwave applications
    Niu, GF
    Ansley, WE
    Zhang, SM
    Cressler, JD
    Webster, CS
    Groves, RA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (08) : 1589 - 1598
  • [43] Recent progress in low-temperature CVD growth of 2D materials
    Zhang, Xiang
    Lai, Jiawei
    Gray, Tia
    OXFORD OPEN MATERIALS SCIENCE, 2023, 3 (01):
  • [44] Mn-doped SiGe thin films grown by UHV/CVD with room-temperature ferromagnetism and high hole mobility
    Shen, Limeng
    Zhang, Xi
    Wang, Jiaqi
    Wang, Jianyuan
    Li, Cheng
    Xiang, Gang
    SCIENCE CHINA-MATERIALS, 2022, 65 (10) : 2826 - 2832
  • [45] Epitaxial growth of thick Ge layers with low dislocation density on silicon substrate by UHV/CVD
    Chen Cheng-Zhao
    Zheng Yuan-Yu
    Huang Shi-Hao
    Li Cheng
    Lai Hong-Kai
    Chen Song-Yan
    ACTA PHYSICA SINICA, 2012, 61 (07)
  • [46] Growth of thick Ge epitaxial layers with low dislocation density on silicon substrate by UHV/CVD
    Zhou, Zhiwen
    Cai, Zhimeng
    Zhang, Yong
    Cai, Kunhuang
    Zhou, Bi
    Lin, Guijiang
    Wang, Jianyuan
    Li, Cheng
    Lai, Hongkai
    Chen, Songyan
    Yu, Jinzhong
    Wang, Qiming
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2008, 29 (02): : 315 - 318
  • [47] LOW-TEMPERATURE CVD GROWTH OF TUNGSTEN DISILICIDE
    LEHRER, WI
    PIERCE, JM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : C97 - C97
  • [48] Low ambient temperature CVD growth of carbon nanotubes
    S. Dittmer
    O.A. Nerushev
    E.E.B. Campbell
    Applied Physics A, 2006, 84 : 243 - 246
  • [49] Low ambient temperature CVD growth of carbon nanotubes
    Dittmer, S.
    Nerushev, O. A.
    Campbell, E. E. B.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2006, 84 (03): : 243 - 246
  • [50] Low temperature CVD growth of ultrathin carbon films
    Yang, Chao
    Wu, Peng
    Gan, Wei
    Habib, Muhammad
    Xu, Weiyu
    Fang, Qi
    Song, Li
    AIP ADVANCES, 2016, 6 (05)