Annealing characteristics of Zn-doped InN Films on sapphire substrates by reactive magnetron sputtering

被引：0
|
作者：
机构：
[1] Chen, Lung-Chien
[2] Chen, Hung-Chang
来源：
Chen, L.-C. (ocean@ntut.edu.tw) | 1600年 / Japan Society of Applied Physics卷 / 44期
关键词：
16;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Annealing characteristics of Zn-doped InN films on sapphire substrates by reactive magnetron sputtering
    Chen, LC
    Chen, HC
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (5A): : 2995 - 2997
  • [2] Growth of InN films on (111)GaAs substrates by reactive magnetron sputtering
    Guo, QX
    Murata, K
    Nishio, M
    Ogawa, H
    [J]. APPLIED SURFACE SCIENCE, 2001, 169 : 340 - 344
  • [3] Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering
    Zhang, Wenjie
    Zhu, Shenglong
    Li, Ying
    Wang, Fuhui
    [J]. VACUUM, 2007, 82 (03) : 328 - 335
  • [4] Structural and photocatalytic properties of undoped and Zn-doped CuO thin films deposited by reactive magnetron sputtering
    Karazmoudeh, N. Jalalian
    Soltanieh, M.
    Hasheminiasari, M.
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2023, 947
  • [5] InN thin films deposited on flexible substrates by reactive RF-magnetron sputtering
    Zoita, N. C.
    Besleaga, C.
    Braic, L.
    Mitran, T.
    Grigorescu, C.
    Nedelcu, L.
    [J]. OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2008, 2 (11): : 719 - 720
  • [6] Phosphorus-doped ZnO films grown nitrogen ambience by magnetron sputtering on sapphire substrates
    Ahn, Cheol Hyoun
    Kim, Young Yi
    Kang, Si Woo
    Cho, Hyung Koun
    [J]. PHYSICA B-CONDENSED MATTER, 2007, 401 (370-373) : 370 - 373
  • [7] Eu-doped GaN films grown on sapphire and GaAs substrates by RF magnetron sputtering
    Yudate, S.
    Fujii, T.
    Shirakata, S.
    [J]. IUMRS-ICA 2008 SYMPOSIUM AA. RARE-EARTH RELATED MATERIAL PROCESSING AND FUNCTIONS, 2008, 1
  • [8] Characterization of CuAlO2 thin films prepared on sapphire substrates by reactive sputtering and annealing
    Tsuboi, Nozomu
    Moriya, Tomohiro
    Kobayashi, Satoshi
    Shimizu, Hidehiko
    Kato, Keizo
    Kaneko, Futao
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (01) : 592 - 595
  • [9] Characterization of CuAlO2 thin films prepared on sapphire substrates by reactive sputtering and annealing
    Tsuboi, Nozomu
    Moriya, Tomohiro
    Kobayashi, Satoshi
    Shimizu, Hidehiko
    Kato, Keizo
    Kaneko, Futao
    [J]. Japanese Journal of Applied Physics, 2008, 47 (1 PART 2): : 592 - 595
  • [10] Growth and nanostructure of InN thin films deposited by reactive magnetron sputtering
    Takai, O
    Ikuta, K
    Inoue, Y
    [J]. THIN SOLID FILMS, 1998, 318 (1-2) : 148 - 150
12345