Optimization of low-temperature poly-Si TFT-LCDs and a large-scale production line for large glass substrates

An update of the progress of inherently low-temperature poly-Si (LTPS) technologies, such as ELA, ion doping, and activation in conjunction with chemical vapor deposition (CVD) and photolithography will be given. We will also discuss whether LTPS LCDs will be applied to a large-scale production line using a large motherglass substrate. It was found that a more-powerful excimer laser as well as photolithography with higher-resolution and a more-precise overlaid arrangement would enable a large-scale production line handling motherglass of 4th generation size to be constructed in the very near future with reasonable investment and productivity costs.