Comparison study of nucleation and growth characteristics of chemical-vapor-deposited diamond films on CoSi2 (001) and Si(001)

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作者：
Gu, C.Z.
Jiang, X.
Kappius, L.
Mantl, S.
机构：
[1] Fraunhofer-Inst. Schicht- und O., Bienroder Weg 54E, 38108 Braunschweig, Germany
[2] Inst. fur Schicht- und Lonentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany
[3] Natl. Lab. of Superhard Materials, Jilin University, Changchun 130023, China
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| 1743年 / American Institute of Physics Inc.卷 / 87期
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