AIGaN/GaN high electron mobility transistors with inclined-gate-recess structure

被引:0
|
作者
Aoi, Yuma [1 ]
Ohno, Yutaka [1 ]
Kishimoto, Shigeru [1 ]
Maezawa, Koichi [1 ]
Mizutani, Takashi [1 ,2 ]
机构
[1] Department of Quantum Engineering, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
[2] Institute for Advanced Research, Nagoya University, Nagoya 464-8601, Japan
来源
关键词
Compendex;
D O I
暂无
中图分类号
学科分类号
摘要
Electric currents - Electric fields - Frequencies - Gallium nitride
引用
下载
收藏
相关论文
共 50 条
  • [21] Controlled gate surface processing of AlGaN/GaN high electron mobility transistors
    Walker, Dennis E., Jr.
    Fitch, Robert C., Jr.
    Gillespie, James K.
    Jessen, Gregg H.
    Cassity, Paul D.
    Breedlove, Joseph R.
    Brillson, Leonard J.
    APPLIED PHYSICS LETTERS, 2006, 89 (18)
  • [22] Polarization effects in ferroelectric gate AlGaN/GaN High Electron Mobility Transistors
    Zhou, R.
    Li, L.
    Zhao, W.
    Liao, Z.
    Nguyen, M. D.
    Nunnenkamp, M.
    Houwman, E. P.
    Koster, G.
    Rijnders, A. J. H. M.
    Gravesteijn, D. J.
    Hueting, R. J. E.
    PROCEEDINGS OF THE 2020 32ND INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD 2020), 2020, : 329 - 332
  • [23] Modeling of the reverse gate leakage in AlGaN/GaN high electron mobility transistors
    Sudharsanan, S.
    Karmalkar, Shreepad
    JOURNAL OF APPLIED PHYSICS, 2010, 107 (06)
  • [24] Large gate leakage current in AlGaN/GaN high electron mobility transistors
    Mizuno, S
    Ohno, Y
    Kishimoto, S
    Maezawa, K
    Mizutani, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (08): : 5125 - 5126
  • [25] AlGaN/GaN High Electron Mobility Transistors on Si with Sputtered TiN Gate
    Li, Yang
    Ng, Geok Ing
    Arulkumaran, Subramaniam
    Kumar, Chandra Mohan Manoj
    Ang, Kian Siong
    Liu, Zhi Hong
    2016 COMPOUND SEMICONDUCTOR WEEK (CSW) INCLUDES 28TH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE & RELATED MATERIALS (IPRM) & 43RD INTERNATIONAL SYMPOSIUM ON COMPOUND SEMICONDUCTORS (ISCS), 2016,
  • [26] Large gate leakage current in AlGaN/GaN high electron mobility transistors
    Mizuno, Shinya
    Ohno, Yutaka
    Kishimoto, Shigeru
    Maezawa, Koichi
    Mizutani, Takashi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (08): : 5125 - 5126
  • [27] On the reverse gate leakage current of AlGaN/GaN high electron mobility transistors
    Yan, Dawei
    Lu, Hai
    Cao, Dongsheng
    Chen, Dunjun
    Zhang, Rong
    Zheng, Youdou
    APPLIED PHYSICS LETTERS, 2010, 97 (15)
  • [28] Mechanism of the reverse gate leakage in AlGaN/GaN high electron mobility transistors
    Karmalkar, S
    Sathaiya, DM
    Shur, MS
    APPLIED PHYSICS LETTERS, 2003, 82 (22) : 3976 - 3978
  • [29] Large Signal Model of AIGaN/GaN High Electron Mobility Transistor
    Jiang Xia
    Yang Ruixia
    Zhao Zhengping
    Zhang Zhiguo
    Feng Zhihong
    2010 THE 3RD INTERNATIONAL CONFERENCE ON COMPUTATIONAL INTELLIGENCE AND INDUSTRIAL APPLICATION (PACIIA2010), VOL V, 2010, : 335 - 336
  • [30] Characterization of Al2O3 /GaN/AlGaN/GaN metalinsulator-semiconductor high electron mobility transistors with different gate recess depths
    马晓华
    潘才渊
    杨丽媛
    于惠游
    杨凌
    全思
    王昊
    张进成
    郝跃
    Chinese Physics B, 2011, 20 (02) : 462 - 467