Analysis research of undercutting phenomenon in wet anisotropic etching process

被引:0
|
作者
Zhang, Han [1 ]
Li, Weihua [1 ]
机构
[1] Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing 210096, China
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:944 / 950
相关论文
共 50 条
  • [31] Composition tailored isotropic and anisotropic wet etching of glass
    Manasa, Aibhattra M.
    Deepu, Bagur R.
    Savitha, Purakkat
    [J]. MATERIALS TODAY-PROCEEDINGS, 2021, 42 : 1270 - 1273
  • [32] Micromachined multilevel silicon structure by anisotropic wet etching
    Chung, CK
    Lee, CC
    [J]. INTERNATIONAL JOURNAL OF NONLINEAR SCIENCES AND NUMERICAL SIMULATION, 2002, 3 (3-4) : 411 - 414
  • [33] Level Set Approach to Anisotropic Wet Etching of Silicon
    Radjenovic, Branislav
    Radmilovic-Radjenovic, Marija
    Mitric, Miodrag
    [J]. SENSORS, 2010, 10 (05) : 4950 - 4967
  • [34] Research on TMAH wet etching in MEMS
    Luo, Yuan
    Li, Xiang-Dong
    Fu, Hong-Qiao
    Huang, Shang-Lian
    [J]. Bandaoti Guangdian/Semiconductor Optoelectronics, 2003, 24 (02):
  • [35] A 3-D Simulator for Silicon Anisotropic Wet Chemical Etching Process Based on Cellular Automata
    Zhou, Zai-Fa
    Huang, Qing-An
    Li, Wei-Hua
    Zhu, Chi
    [J]. INTERNATIONAL MEMS CONFERENCE 2006, 2006, 34 : 674 - 679
  • [36] Fabrication of sharp silicon tips employing anisotropic wet etching and reactive ion etching
    Alves, MAR
    Takeuti, DF
    Braga, ES
    [J]. MICROELECTRONICS JOURNAL, 2005, 36 (01) : 51 - 54
  • [37] Wet anisotropic etching for fluidic 1D nanochannels
    Haneveld, J
    Jansen, H
    Berenschot, E
    Tas, N
    Elwenspoek, M
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2003, 13 (04) : S62 - S66
  • [38] 3-D modeling of anisotropic wet etching of silicon
    Duk, Mariusz
    Kociubinski, Andrzej
    Bieniek, Tomasz
    Janus, Pawel
    [J]. PRZEGLAD ELEKTROTECHNICZNY, 2010, 86 (07): : 281 - 283
  • [40] Simulation of anisotropic wet chemical etching using a physical model
    van Veenendaal, E
    Nijdam, AJ
    van Suchtelen, J
    Sato, K
    Gardeniers, JGE
    van Enckevort, WJP
    Elwenspoek, M
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 2000, 84 (03) : 324 - 329