Effects of temperature on the morphology and structure of AlN films deposited by reactive magnetron sputtering

被引:0
|
作者
Zheng, Xiao-Juan [1 ]
Wang, Juan [1 ]
Li, Shan-Feng [1 ]
Zhang, Qing-Yu [1 ]
机构
[1] Lab. of Mat. Modification, Dalian Univ. of Technol., Dalian 116024, China
来源
关键词
Silicon substrates - Surface morphology - Temperature effects;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:93 / 96
相关论文
共 50 条
  • [41] Thickness Optimization of AlN Thin Films Deposited By RF Magnetron Sputtering
    Uzgur, Sinem
    Hutson, David
    Kirk, Katherine
    2012 INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS HELD JOINTLY WITH 11TH IEEE ECAPD AND IEEE PFM (ISAF/ECAPD/PFM), 2012,
  • [42] Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
    Singh, Sukhvinder
    Srinivasa, R. S.
    Major, S. S.
    THIN SOLID FILMS, 2007, 515 (24) : 8718 - 8722
  • [43] Effects of sputtering power on structure and properties of Ti films deposited by DC magnetron sputtering
    Department of Physics, Key Laboratory for Irradiation Physics and Technology, Sichuan University, Chengdu 610064, China
    不详
    不详
    Qiangjiguang Yu Lizishu, 2006, 6 (961-964):
  • [44] Crystallization of alumina films deposited by reactive magnetron sputtering with resputtering technique at low temperature
    Zhang, Xiaopeng
    Zhu, Jiaqi
    Zhang, Lixia
    Kishimoto, Kikuo
    Du, ShanYi
    Yin, Xunbo
    SURFACE & COATINGS TECHNOLOGY, 2013, 228 : S393 - S396
  • [45] Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering
    Du, Mingjun
    Wu, Zhiming
    Luo, Zhenfei
    Xu, Xiangdong
    Yu, Junsheng
    Jiang, Yadong
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
  • [46] Growth dynamics of reactive-sputtering-deposited AlN films
    Auger, M.A.
    Vázquez, L.
    Sánchez, O.
    Jergel, M.
    Cuerno, R.
    Castro, M.
    Journal of Applied Physics, 2005, 97 (12):
  • [47] Reactive magnetron sputtering deposition of TiN films .1. Influence of the substrate temperature on structure, composition and morphology of the films
    Combadiere, L
    Machet, J
    SURFACE & COATINGS TECHNOLOGY, 1997, 88 (1-3): : 17 - 27
  • [48] Morphology and physical properties of titanium nitride films deposited by magnetron sputtering at room temperature
    Huang, Jiamu
    Xu, Chengjun
    Zhang, Xingyuan
    Wang, Yaping
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2005, 25 (04): : 297 - 300
  • [49] Copper nitride films deposited by dc reactive magnetron sputtering
    K. Venkata Subba Reddy
    A. Sivasankar Reddy
    P. Sreedhara Reddy
    S. Uthanna
    Journal of Materials Science: Materials in Electronics, 2007, 18 : 1003 - 1008
  • [50] Studies on zirconium nitride films deposited by reactive magnetron sputtering
    Bhuvaneswari, HB
    Priya, IN
    Chandramani, R
    Reddy, VR
    Rao, GM
    CRYSTAL RESEARCH AND TECHNOLOGY, 2003, 38 (12) : 1047 - 1051