Morphology and physical properties of titanium nitride films deposited by magnetron sputtering at room temperature

被引：0
|
作者：
Huang, Jiamu [1 ]
Xu, Chengjun [1 ]
Zhang, Xingyuan [1 ]
Wang, Yaping [1 ]
机构：
[1] Institute of Materials Science and Engineering, Chongqing University, Chongqing 400045, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2005年 / 25卷 / 04期
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14;
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页码：297 / 300
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