Morphology and physical properties of titanium nitride films deposited by magnetron sputtering at room temperature

被引：0
|
作者：
Huang, Jiamu [1 ]
Xu, Chengjun [1 ]
Zhang, Xingyuan [1 ]
Wang, Yaping [1 ]
机构：
[1] Institute of Materials Science and Engineering, Chongqing University, Chongqing 400045, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2005年 / 25卷 / 04期
关键词：
14;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：297 / 300
相关论文
共 50 条
  • [21] The influence of ion implantation on the properties of titanium nitride layer deposited by magnetron sputtering
    Ruset, C
    Grigore, E
    SURFACE & COATINGS TECHNOLOGY, 2002, 156 (1-3): : 159 - 161
  • [22] Electrical properties of titanium nitride films synthesized by reactive magnetron sputtering
    Mohammed, W. M.
    Gumarov, A. I.
    Vakhitov, I. R.
    Yanilkin, I. V.
    Kiiamov, A. G.
    Kharintsev, S. S.
    Nikitin, S. I.
    Tagirov, L. R.
    Yusupov, R. V.
    INTERNATIONAL CONFERENCE - THE PHYSICS OF LOW TEMPERATURE PLASMA (PLTP-2017), 2017, 927
  • [23] The effect of thickness on the properties of titanium films deposited by dc magnetron sputtering
    Jeyachandran, Y. L.
    Karunagaran, B.
    Narayandass, Sa. K.
    Mangalaraj, D.
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 458 (1-2): : 361 - 365
  • [24] Properties of titanium nitride films prepared by direct current magnetron sputtering
    Jeyachandran, Y. L.
    Narayandass, Sa. K.
    Mangalaraj, D.
    Areva, Sami
    Mieluarski, J. A.
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 445 : 223 - 236
  • [25] Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
    Mahieu, S
    Ghekiere, P
    De Winter, G
    De Gryse, R
    Depla, D
    Van Tendeloo, G
    Lebedev, OI
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (08): : 2764 - 2768
  • [26] Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications
    Merie, Violeta
    Pustan, Marius
    Negrea, Gavril
    Birleanu, Corina
    APPLIED SURFACE SCIENCE, 2015, 358 : 525 - 532
  • [27] Influence of Substrate Temperature on Silicon Nitride Films Deposited by RF Magnetron Sputtering
    Gao, Feng
    Zhao, Qingnan
    Zhao, Xiujian
    ADVANCES IN COMPOSITES, PTS 1 AND 2, 2011, 150-151 : 1391 - 1395
  • [28] Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering
    Guruvenket, S
    Rao, GM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (03): : 678 - 682
  • [29] Growth Evolution of AZO thin Films Deposited by Magnetron Sputtering at Room Temperature
    Ramos, R.
    Chaves, M.
    Martins, E.
    Durrant, Steven F.
    Rangel, E. C.
    da Silva, T. F.
    Bortoleto, J. R. R.
    MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 2021, 24 (S1):
  • [30] Optical properties of zinc nitride films deposited by the rf magnetron sputtering method
    Jayatissa, Ahalapitiya H.
    Wen, Ting
    Gautam, Madhav
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (04)
12345