High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition

被引：0
|
作者：
Spiller, Eberhard [1 ]
Baker, Sherry L. [1 ]
Mirkarimi, Paul B. [1 ]
Sperry, Victor [1 ]
Gullikson, Eric M. [2 ]
Stearns, Daniel G. [3 ]
机构：
[1] Lawrence Livermore Natl. Laboratory, P.O. Box 808, Livermore, CA 94551, United States
[2] Center for X-Ray Optics, Lawrence Berkeley Natl. Laboratory, Berkeley, CA 94720, United States
[3] OS Associates, 1174 Castro Street, Mountain View, CA 94040, United States
来源：
Applied Optics | 2003年 / 42卷 / 19期
关键词：
Profile control;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：4049 / 4058
相关论文
共 50 条
  • [21] Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering
    Murakami, K
    Shiraishi, M
    SOFT X-RAY AND EUV IMAGING SYSTEMS II, 2001, 4506 : 56 - 64
  • [22] DEFECT COVERAGE PROFILE AND PROPAGATION OF ROUGHNESS OF SPUTTER-DEPOSITED MO/SI MULTILAYER COATING FOR EXTREME-ULTRAVIOLET PROJECTION LITHOGRAPHY
    NGUYEN, KB
    NGUYEN, TD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2964 - 2970
  • [23] Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet
    Slaughter, J.M.
    Schulze, Dean W.
    Hills, C.R.
    Mirone, A.
    Stalio, R.
    Watts, R.N.
    Tarrio, C.
    Lucatorto, T.B.
    Krumrey, M.
    Mueller, P.
    Falco, Charles M.
    Journal of Applied Physics, 1994, 76 (04): : 2144 - 2156
  • [24] High-precision reflectometry of multilayer coatings for Extreme Ultraviolet Lithography
    Wedowski, M
    Underwood, JH
    Gullikson, EM
    Bajt, S
    Folta, JA
    Kearney, PA
    Montcalm, C
    Spiller, E
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 83 - 93
  • [25] ION-BEAM-DEPOSITED BORON-CARBIDE COATINGS FOR THE EXTREME-ULTRAVIOLET
    BLUMENSTOCK, GM
    KESKIKUHA, RAM
    APPLIED OPTICS, 1994, 33 (25): : 5962 - 5963
  • [26] Improved Ru/Si multilayer reflective coatings for advanced extreme ultraviolet lithography photomasks
    Wood, Obert
    Wong, Keith
    Parks, Valentin
    Kearney, Patrick
    Meyer-Ilse, Julia
    Vu Luong
    Philipsen, Vicky
    Faheem, Mohammad
    Liang, Yifan
    Kumar, Ajay
    Chen, Esther
    Bennett, Corbin
    Fu, Bianzhu
    Gribelyuk, Michael
    Zhao, Wayne
    Mangat, Pawitter
    van der Heide, Paul
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII, 2016, 9776
  • [27] EXTREME-ULTRAVIOLET MO/SI MULTILAYER MIRRORS DEPOSITED BY RADIO-FREQUENCY-MAGNETRON SPUTTERING
    MONTCALM, C
    SULLIVAN, BT
    PEPIN, H
    DOBROWOLSKI, JA
    SUTTON, M
    APPLIED OPTICS, 1994, 33 (10): : 2057 - 2068
  • [28] Mo/Si multilayers for EUV lithography by ion beam sputter deposition
    Chassé, T
    Neumann, H
    Ocker, B
    Scherer, M
    Frank, W
    Frost, F
    Hirsch, D
    Schindler, A
    Wagner, G
    Lorenz, M
    Otto, G
    Zeuner, M
    Rauschenbach, B
    VACUUM, 2003, 71 (03) : 407 - 415
  • [29] Multilayer coatings with high reflectance in the extreme-ultraviolet spectral range of 50 to 121.6 nm
    Larruquert, JI
    Keski-Kuha, RAM
    APPLIED OPTICS, 1999, 38 (07) : 1231 - 1236
  • [30] Ultrahigh vacuum deposition reflectometer system for the in situ investigation of Y/Mo extreme-ultraviolet multilayer mirrors
    Montcalm, C
    Sullivan, BT
    Ranger, M
    Pepin, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (06): : 3069 - 3081
12345