High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition

被引：0
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作者：
Spiller, Eberhard [1 ]
Baker, Sherry L. [1 ]
Mirkarimi, Paul B. [1 ]
Sperry, Victor [1 ]
Gullikson, Eric M. [2 ]
Stearns, Daniel G. [3 ]
机构：
[1] Lawrence Livermore Natl. Laboratory, P.O. Box 808, Livermore, CA 94551, United States
[2] Center for X-Ray Optics, Lawrence Berkeley Natl. Laboratory, Berkeley, CA 94720, United States
[3] OS Associates, 1174 Castro Street, Mountain View, CA 94040, United States
来源：
Applied Optics | 2003年 / 42卷 / 19期
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页码：4049 / 4058
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