Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet

被引：0

作者：

Slaughter, J.M. ^{[1
]}

Schulze, Dean W. ^{[1
]}

Hills, C.R. ^{[1
]}

Mirone, A. ^{[1
]}

Stalio, R. ^{[1
]}

Watts, R.N. ^{[1
]}

Tarrio, C. ^{[1
]}

Lucatorto, T.B. ^{[1
]}

Krumrey, M. ^{[1
]}

Mueller, P. ^{[1
]}

Falco, Charles M. ^{[1
]}

机构：

[1] Univ of Arizona, Tucson, United States

来源：

Journal of Applied Physics | 1994年 / 76卷 / 04期

关键词：

Characterization - Composition - Interfaces (materials) - Molybdenum - Morphology - Silicon - Sputter deposition - Structure (composition) - Synchrotron radiation - Transmission electron microscopy - Ultraviolet radiation - X ray analysis;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

This study aims to compare multilayer made by sputtering and evaporation and to show how each of the structural and compositional parameters that describe a multilayer, affects the EUV reflectivity. To accomplish these goals, the rigorous characterization routine described here is necessary. Through the use of various deposition parameters, multilayers are made, and they are characterized with three types of x-ray diffraction, TEM, Rutherford backscattering spectrometry, and Auger depth profiling. Their performance was evaluated by measuring the EUV reflectivity as a function of wavelength using a synchrotron-radiation source.

引用

页码：2144 / 2156

共 50 条

[1] STRUCTURE AND PERFORMANCE OF SI/MO MULTILAYER MIRRORS FOR THE EXTREME-ULTRAVIOLET
SLAUGHTER, JM
SCHULZE, DW
HILLS, CR
MIRONE, A
STALIO, R
WATTS, RN
TARRIO, C
LUCATORTO, TB
KRUMREY, M
MUELLER, P
FALCO, CM
JOURNAL OF APPLIED PHYSICS, 1994, 76 (04) : 2144 - 2156
[2] Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors
Yang, Song
Chen, Shujing
Lin, Chengyou
JOURNAL OF SYNCHROTRON RADIATION, 2021, 28 : 1437 - 1443
[3] Reduction of residual stress in extreme ultraviolet Mo/Si multilayer mirrors with postdeposition thermal treatments
Montcalm, C
OPTICAL ENGINEERING, 2001, 40 (03) : 469 - 477
[4] Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors
Soer, Wouter A.
van Herpen, Maarten M. J. W.
Jak, Martin J. J.
Gawlitza, Peter
Braun, Stefan
Salashchenko, Nikolay N.
Chkhalo, Nikolay I.
Banine, Vadim Y.
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
[5] EXTREME-ULTRAVIOLET MO/SI MULTILAYER MIRRORS DEPOSITED BY RADIO-FREQUENCY-MAGNETRON SPUTTERING
MONTCALM, C
SULLIVAN, BT
PEPIN, H
DOBROWOLSKI, JA
SUTTON, M
APPLIED OPTICS, 1994, 33 (10): : 2057 - 2068
[6] Fabrication of Mo/Si multilayer mirrors for extreme ultraviolet lithography by means of superconducting bulk magnet magnetron sputtering
Mizutani, U.
Yamaguchi, T.
Ikuta, H.
Tomofuji, T.
Yanagi, Y.
Itoh, Y.
Oka, T.
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2008, 468 (15-20): : 1456 - 1460
[7] Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
Wedowski, M
Bajt, S
Folta, JA
Gullikson, EM
Kleineberg, U
Klebanoff, LE
Malinowski, ME
Clift, WM
EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES, 1999, 3767 : 217 - 224
[8] Resonance effects in photoemission from TiO2-capped Mo/Si multilayer mirrors for extreme ultraviolet applications
Faradzhev, Nadir S.
Yakshinskiy, Boris V.
Starodub, Elena
Madey, Theodore E.
Hill, Shannon B.
Grantham, Steven
Lucatorto, Thomas B.
Yulin, Sergiy
Vescovo, Elio
Keister, Jeffrey W.
JOURNAL OF APPLIED PHYSICS, 2011, 109 (08)
[9] Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
Bajt, SA
Chapman, HN
Nguyen, N
Alameda, J
Robinson, JC
Malinowski, M
Gullikson, E
Aquila, A
Tarrio, C
Grantham, S
APPLIED OPTICS, 2003, 42 (28) : 5750 - 5758
[10] Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
Bajt, Saša
Chapman, Henry N.
Nguyen, Nhan
Alameda, Jennifer
Robinson, Jeffrey C.
Malinowski, Michael
Gullikson, Eric
Aquila, Andrew
Tarrio, Charles
Grantham, Steven
Applied Optics, 2003, 42 (28): : 5750 - 5758

← 1 2 3 4 5 →