Glow discharge mass spectroscopy study of ion concentrations of joints in anodic bonding of borosilicate glass to ultrathin silicon

被引：0
|
作者：
Itoh, Takaki [1 ]
机构：
[1] Industrial Technology Center of Wakayama Prefecture, 60, Ogura, Wakayama, Wakayama,649-6261, Japan
来源：
IEEJ Transactions on Sensors and Micromachines | 2016年 / 136卷 / 11期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Mass spectrometry
引用
收藏
页码：478 / 481
相关论文
共 47 条
  • [41] Characterization of interfaces of directly bonded silicon wafers: A comparative study of secondary ion mass spectroscopy multiple internal reflection spectroscopy, and transmission electron microscopy
    Reiche, M
    Hopfe, S
    Gosele, U
    Strutzberg, H
    Tong, QY
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (4A): : 2102 - 2107
  • [42] Radiofrequency pulsed glow discharge-ToFMS depth profiling of a CdTe solar cell: A comparative study versus time of flight secondary ion mass spectrometry
    Gonzalez-Gago, Cristina
    Pisonero, Jorge
    Bordel, Nerea
    Sanz-Medel, Alfredo
    Tibbetts, Nicole J.
    Smentkowski, Vincent S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 31 (06):
  • [43] STUDY OF ACTIVE-CENTERS OF SILICON DIOXIDE THIN-FILM SURFACE BY THE SECONDARY ION MASS-SPECTROSCOPY METHOD
    POKROVSKII, VA
    USTYUZHANIN, PF
    MOROZOV, AV
    CHUIKO, AA
    ZHURNAL FIZICHESKOI KHIMII, 1989, 63 (12): : 3370 - 3372
  • [44] Hydrogen Bonding Shuts Down Tunneling in Hydroxycarbenes: A Gas-Phase Study by Tandem-Mass Spectrometry, Infrared Ion Spectroscopy, and Theory
    Paul, Mathias
    Thomulka, Thomas
    Harnying, Wacharee
    Neudoerfl, Joerg-Martin
    Adams, Charlie R.
    Martens, Jonathan
    Berden, Giel
    Oomens, Jos
    Meijer, Anthony J. H. M.
    Berkessel, Albrecht
    Schaefer, Mathias
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2023, 145 (22) : 12124 - 12135
  • [45] COMPARATIVE STUDY OF SI(111), SILICON-OXIDE, SIC AND SI3N4 SURFACES BY SECONDARY ION MASS-SPECTROSCOPY (SIMS)
    BENNINGHOVEN, A
    SICHTERMANN, W
    STORP, S
    THIN SOLID FILMS, 1975, 28 (01) : 59 - 64
  • [46] Ultra-low temperature anodic bonding of silicon and glass based on nano-gap dielectric barrier discharge基于纳米间隙介质阻挡放电的硅与玻璃超低温阳极键合
    Fu-rong Yao
    Ming-qiang Pan
    Zong-jian Zhu
    Ji-zhu Liu
    Yang-jun Wang
    Journal of Central South University, 2021, 28 : 351 - 360
  • [47] A TIME-OF-FLIGHT STATIC SECONDARY ION MASS-SPECTROMETRY AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF 3-AMINOPROPYLTRIHYDROXYSILANE ON WATER PLASMA TREATED CHROMIUM AND SILICON SURFACES
    ELDRIDGE, BN
    BUCHWALTER, LP
    CHESS, CA
    GOLDBERG, MJ
    GOLDBLATT, RD
    NOVAK, FP
    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1992, 6 (01) : 109 - 125
12345