Evaluation of effective image blurring factors in the synchrotron proximity X-ray lithography

被引：0
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作者：
Seo, Yongduck [1 ]
Kim, Ohyun [1 ]
机构：
[1] Pohang Univ of Science and, Technology, Pohang, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 2000年 / 39卷 / 12期
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摘要：
13
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页码：6942 / 6946
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