Study on synchrotron radiation soft X-ray lithography technology

被引：0
|
作者：
Sun, Baoyin [1 ]
Chen, Mengzhen [1 ]
机构：
[1] Microelectronics Research and, Development Cent, Academia Sinica, Beijing, China
来源：
Weixi Jiagong Jishu/Microfabrication Technology | 1993年 / 04期
关键词：
Soft X ray lithography;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
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页码：23 / 28
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