Evaluation of effective image blurring factors in the synchrotron proximity X-ray lithography

被引：0
|
作者：
Seo, Yongduck [1 ]
Kim, Ohyun [1 ]
机构：
[1] Pohang Univ of Science and, Technology, Pohang, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 2000年 / 39卷 / 12期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
13
引用
收藏
页码：6942 / 6946
相关论文
共 50 条
  • [31] PERFORMANCE OF THE IBM SYNCHROTRON X-RAY SOURCE FOR LITHOGRAPHY
    ARCHIE, C
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) : 373 - 384
  • [32] Study on Fabrication of X-ray Collimators by X-ray Lithography Using Synchrotron Radiation
    Saegusa, Shunya
    Narukage, Noriyuki
    Utsumi, Yuichi
    Yamaguchi, Akinobu
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2021, 34 (02) : 213 - 218
  • [33] Evaluation of image shortening for rectangular array patterns in X-ray lithography
    Mitsui, S
    Tanaka, Y
    Taguchi, T
    Gomei, Y
    Hisatsugu, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (12B): : 6799 - 6803
  • [34] Evaluation of the waveguide effect in proximity x-ray lithography using an optical trace method
    Ogawa, Taro, 1600, JJAP, Minato-ku, Japan (34):
  • [35] Analysis of nanometer isolated trench diffract aerial image of both conventional and second generation synchrotron-based proximity x-ray lithography
    Xie, CQ
    Chen, DP
    Liu, M
    Ye, TC
    Yi, FT
    Advanced Microlithography Technologies, 2005, 5645 : 299 - 306
  • [36] Overlay and critical dimension control in proximity x-ray lithography
    Fujii, K
    Tanaka, Y
    Suzuki, K
    Iwamoto, T
    Tsuboi, S
    Matsui, Y
    NEC RESEARCH & DEVELOPMENT, 2001, 42 (01): : 27 - 31
  • [37] Mask and wafer inspection and cleaning for Proximity X-ray Lithography
    Leavey, J
    Mangat, PJS
    EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 : 179 - 188
  • [38] Overlay and critical dimension control in proximity x-ray lithography
    Fujii, K.
    Tanaka, Y.
    Suzuki, K.
    Iwamoto, T.
    Tsuboi, S.
    Matsui, Y.
    NEC Research and Development, 2001, 42 (01): : 27 - 31
  • [39] Extendibility of proximity x-ray lithography to 25 nm and below
    Toyota, E
    Washio, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2979 - 2983
  • [40] New results in high energy proximity x-ray lithography
    Khan, M
    Han, G
    Maldonado, J
    Cerrina, F
    EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 : 176 - 181
12345