Influence of RF-power on microstructure and properties of microcrystalline silicon thin films

被引：0
|
作者：
Zhang, Lin-Rui [1 ]
Zhou, Bing-Qing [1 ]
Zhang, Li-Li [1 ]
Li, Hai-Quan [1 ]
机构：
[1] Key Laboratory of Physics and Chemistry for Functional Material, College of Physics and Electron Information of Inner Mongolia Normal University, Huhhot 010022, China
来源：
Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2013年 / 42卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：418 / 422
相关论文
共 50 条
  • [21] Study of the effect of the deposition RF power on the characteristics of microcrystalline Silicon-Germanium thin films produced by PECVD
    Torres, Arturo
    Moreno, Mario
    Rosales, Pedro
    Dominguez, Miguel
    Torres, Alfonso
    Itzmoyotl, Adrian
    Ambrosio, Roberto
    de la Hidalga, Javier
    MRS ADVANCES, 2018, 3 (64): : 3939 - 3947
  • [22] Study of the effect of the deposition RF power on the characteristics of microcrystalline Silicon-Germanium thin films produced by PECVD
    Arturo Torres
    Mario Moreno
    Pedro Rosales
    Miguel Domínguez
    Alfonso Torres
    Adrian Itzmoyotl
    Roberto Ambrosio
    Javier de la Hidalga
    MRS Advances, 2018, 3 (64) : 3939 - 3947
  • [23] Electronic and topographic properties of amorphous and microcrystalline silicon thin films
    Kleider, JP
    Longeaud, C
    Brüggemann, R
    Houzé, F
    THIN SOLID FILMS, 2001, 383 (1-2) : 57 - 60
  • [24] Role of substrate temperature on the properties of microcrystalline silicon thin films
    Mukhopadhyay, S
    Saha, SC
    Ray, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (11): : 6284 - 6289
  • [25] Characterization of microstructures and optoelectrical properties of microcrystalline silicon thin films
    Zhou, B. (zhoubq@imnu.edu.cn), 1600, Science Press (34):
  • [26] Microstructure and electronic properties of microcrystalline silicon carbide thin films prepared by hot-wire CVD
    Chen, T.
    Koehler, F.
    Heidt, A.
    Huang, Y.
    Finger, F.
    Carius, R.
    THIN SOLID FILMS, 2011, 519 (14) : 4511 - 4515
  • [27] Influence mechanism of RF bias on microstructure and superconducting properties of sputtered niobium thin films
    Zhong, Yuan
    Ni, Zegang
    Li, Jinjin
    Li, Xu
    Cao, Wenhui
    Wang, Xueshen
    Zhong, Qing
    Xu, Xiaolong
    Chen, Jian
    Liang, Congcong
    VACUUM, 2023, 207
  • [28] Influence of RF power on structure and electrical properties of sputtered SrHfON thin films
    Feng, Li-ping
    Liu, Zheng-tang
    Tian, Hao
    Liu, Lu
    MATERIALS LETTERS, 2012, 78 : 66 - 68
  • [29] Influence of RF power and fluorine doping on the properties of sputtered ITO thin films
    Nisha, M.
    Jayaraj, M. K.
    APPLIED SURFACE SCIENCE, 2008, 255 (05) : 1790 - 1795
  • [30] Influence of temperature on deposition rate and properties of microcrystalline silicon films
    Guo, Qun-Chao
    Sun, Jian
    Wei, Chang-Chun
    Geng, Xin-Hua
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2007, 18 (06): : 659 - 662
12345