Influence of RF-power on microstructure and properties of microcrystalline silicon thin films

被引：0
|
作者：
Zhang, Lin-Rui [1 ]
Zhou, Bing-Qing [1 ]
Zhang, Li-Li [1 ]
Li, Hai-Quan [1 ]
机构：
[1] Key Laboratory of Physics and Chemistry for Functional Material, College of Physics and Electron Information of Inner Mongolia Normal University, Huhhot 010022, China
来源：
Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2013年 / 42卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：418 / 422
相关论文
共 50 条
  • [31] Influence of film thickness on structural properties of microcrystalline silicon films
    Yoshioka, Y
    Matsuyama, Y
    Kamisako, K
    CONFERENCE RECORD OF THE TWENTY-NINTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002, 2002, : 1266 - 1269
  • [32] PROPERTIES AND PHOTOVOLTAIC APPLICATIONS OF MICROCRYSTALLINE SILICON FILMS PREPARED BY RF REACTIVE SPUTTERING
    MOUSTAKAS, TD
    MARUSKA, HP
    FRIEDMAN, R
    JOURNAL OF APPLIED PHYSICS, 1985, 58 (02) : 983 - 986
  • [33] Effect of the RF-power and annealing on the structural, optical, morphological and electrical properties of RF-sputtered V2O5 thin films
    Bousseta, Mohammed
    Nkhaili, Lahcen
    Narjis, Abdelfattah
    El Kissani, Abdelkader
    Tchenka, Abdelaziz
    Outzourhit, Abdelkader
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2022, 97
  • [34] Investigation of impurity enrichment and electronic properties of microcrystalline silicon thin films
    Stöger, M
    Breymesser, A
    Schattschneider, P
    Schlosser, V
    MICROSCOPY OF SEMICONDUCTING MATERIALS 2001, 2001, (169): : 391 - 394
  • [35] The crystalline properties of nitrogen doped hydrogenated microcrystalline silicon thin films
    Ehara, T
    THIN SOLID FILMS, 1997, 310 (1-2) : 322 - 326
  • [36] PROPERTIES AND APPLICATION OF UNDOPED HYDROGENATED MICROCRYSTALLINE SILICON THIN-FILMS
    KANICKI, J
    HASAN, E
    KOTECKI, DF
    TAKAMORI, T
    GRIFFITH, JH
    AMORPHOUS SILICON TECHNOLOGY - 1989, 1989, 149 : 173 - 179
  • [37] Study on the properties of P-type microcrystalline silicon thin films
    Institute of Photo-electronics Thin Film Devices and Technique, Nankai University, Tianjin 300071, China
    Rengong Jingti Xuebao, 2006, 5 (927-930):
  • [38] Correlation of electrical, thermal and structural properties of microcrystalline silicon thin films
    Das, Debajyoti
    Jana, Madhusudan
    Barua, Ashok K.
    Chattopadhyay, Surajit
    Chen, Li Chyong
    Chen, Kuei Hsien
    Japanese Journal of Applied Physics, Part 2: Letters, 2002, 41 (3 A):
  • [39] Correlation of electrical, thermal and structural properties of microcrystalline silicon thin films
    Das, D
    Jana, M
    Barua, AK
    Chattopadhyay, S
    Chen, LC
    Chen, KH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2002, 41 (3A): : L229 - L232
  • [40] Influence of rf power on the properties of nanostructured silicon-carbon films deposited by PECVD
    Coscia, U.
    Ambrosone, G.
    Basa, D. K.
    Rava, P.
    Ferrero, S.
    Virga, A.
    Tucci, M.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3, 2011, 8 (03): : 823 - 826
12345