Suppression of leakage current of metal-insulator-semiconductor Ta 2O5 capacitors with Al2O3/SiON buffer layer

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Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan [1 ]
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Jpn. J. Appl. Phys. | / 10 PART 1卷
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539.1 Metals Corrosion - 701.1 Electricity: Basic Concepts and Phenomena - 714.2 Semiconductor Devices and Integrated Circuits - 722.1 Data Storage; Equipment and Techniques - 802.2 Chemical Reactions - 804 Chemical Products Generally - 804.2 Inorganic Compounds - 933.1 Crystalline Solids;
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