Fast scatterometric measurement of periodic surface structures in plasma-etching processes

被引：0
|
作者：
Klesse, Wolfgang Matthias [1 ]
Rathsfeld, Andreas [2 ]
Groß, Claudine [3 ]
Malguth, Enno [3 ]
Skibitzki, Oliver [1 ]
Zealouk, Lahbib [2 ]
机构：
[1] IHP-Leibniz-Institut für innovative Mikroelektronik, im Technologiepark 25, Frankfurt (Oder),12536, Germany
[2] Weierstrass Institute, Mohrenstr. 39, Berlin,10117, Germany
[3] LayTec AG, Seesener Str. 10-13, Berlin,10709, Germany
来源：
Measurement: Journal of the International Measurement Confederation | 2021年 / 170卷
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摘要：
Inverse problems
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