共 50 条
- [32] Effects of focused MeV ion beam irradiation on the roughness of electrochemically micromachined silicon surfaces JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (03): : 500 - 505
- [34] Behavior of gallium secondary ion intensity in gallium focused ion beam secondary ion mass spectrometry Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (3 A): : 1287 - 1291
- [35] Behavior of gallium secondary ion intensity in gallium focused ion beam secondary ion mass spectrometry JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (3A): : 1287 - 1291
- [37] Induced damages on CMOS and bipolar integrated structures under focused ion beam irradiation MICROELECTRONICS AND RELIABILITY, 1998, 38 (6-8): : 901 - 905
- [40] Participation of focused ion beam implanted gallium ions in metal-assisted chemical etching of silicon JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2012, 30 (04):