Germanium nanostructures by helium plasma irradiation

被引：0

作者：

Kajita, Shin ^{[1
]}

Shi, Quan ^{[1
]}

Tabata, Kiho ^{[2
]}

Kuwabara, Tatsuya ^{[3
]}

Tanaka, Hirohiko ^{[4
]}

Ohno, Noriyasu ^{[2
]}

机构：

[1] Univ Tokyo, Grad Sch Frontier Sci, 5-1-5 Kashiwanoha, Kashiwa, Chiba 2778561, Japan

[2] Nagoya Univ, Grad Sch Engn, Nagoya 4648603, Japan

[3] Aichi Inst Technol, Toyota, Japan

[4] Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2024年 / 63卷 / 07期

关键词：

germanium; plasma treatment; nanostructure; TUNGSTEN; SURFACE; GROWTH; SILICON; FRACTALITY; FILMS; GE;

D O I：

10.35848/1347-4065/ad5afe

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effects of helium plasma irradiation, which has been widely studied on metals, on germanium have been experimentally investigated. The irradiation temperature ranges from 430 to 720 K, and the incident ion energy ranges from 30 to 100 eV. From the scanning electron microscope (SEM) observation, it was found that various morphological changes including pits, nanocones, nanopillars, and roughened surfaces occur. The spatial scale of the morphological change was analyzed by applying fast Fourier transform to SEM micrographs. Thermal desorption spectroscopy analysis suggests that He atoms implanted on Ge play major roles in forming roughened surfaces at a surface temperature higher than 500 K.

引用

页数：6

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