Germanium nanostructures by helium plasma irradiation

被引：0

作者：

Kajita, Shin ^{[1
]}

Shi, Quan ^{[1
]}

Tabata, Kiho ^{[2
]}

Kuwabara, Tatsuya ^{[3
]}

Tanaka, Hirohiko ^{[4
]}

Ohno, Noriyasu ^{[2
]}

机构：

[1] Univ Tokyo, Grad Sch Frontier Sci, 5-1-5 Kashiwanoha, Kashiwa, Chiba 2778561, Japan

[2] Nagoya Univ, Grad Sch Engn, Nagoya 4648603, Japan

[3] Aichi Inst Technol, Toyota, Japan

[4] Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2024年 / 63卷 / 07期

关键词：

germanium; plasma treatment; nanostructure; TUNGSTEN; SURFACE; GROWTH; SILICON; FRACTALITY; FILMS; GE;

D O I：

10.35848/1347-4065/ad5afe

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effects of helium plasma irradiation, which has been widely studied on metals, on germanium have been experimentally investigated. The irradiation temperature ranges from 430 to 720 K, and the incident ion energy ranges from 30 to 100 eV. From the scanning electron microscope (SEM) observation, it was found that various morphological changes including pits, nanocones, nanopillars, and roughened surfaces occur. The spatial scale of the morphological change was analyzed by applying fast Fourier transform to SEM micrographs. Thermal desorption spectroscopy analysis suggests that He atoms implanted on Ge play major roles in forming roughened surfaces at a surface temperature higher than 500 K.

引用

页数：6

共 50 条

[31] Irradiation effects of hydrogen and helium plasma on different grade tungsten materials
Liu, X.
Lian, Y. Y.
Greuner, H.
Boeswirth, B.
Jin, Y. Z.
Feng, F.
Wang, J. B.
Chen, L.
Song, J. P.
Yu, Y.
Zhang, T.
Liu, C. S.
Tan, J.
Liu, D. P.
Duan, X. R.
NUCLEAR MATERIALS AND ENERGY, 2017, 12 : 1314 - 1318
[32] Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
Matt Thompson
Luke Magyar
Cormac Corr
Scientific Reports, 9
[33] Effects of low energy helium plasma irradiation on potassium doped tungsten
Shu, Xiaoyan
Huang, Bo
Liu, Dongping
Fan, Hongyu
Liu, Ning
Tang, Jun
FUSION ENGINEERING AND DESIGN, 2017, 117 : 8 - 13
[34] Nanoscale modification of silicon and germanium surfaces exposed to low-energy helium plasma
Thompson, Matt
Magyar, Luke
Corr, Cormac
SCIENTIFIC REPORTS, 2019, 9 (1)
[35] Formation of nanostructures in Ti2AlC induced by high-temperature helium irradiation
Su, Ranran
Zhang, Hongliang
Shi, Liqun
Wen, Haiming
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2019, 39 (06) : 1993 - 2002
[36] Fabrication of silicon and germanium nanostructures by combination of hydrogen plasma dry etching and VLS mechanism
Yang, MC
Shieh, J
Ko, TS
Chen, HL
Chu, TC
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (7B): : 5791 - 5794
[37] Fabrication of silicon and germanium nanostructures by combination of hydrogen plasma dry etching and VLS mechanism
Yang, M.-C., 1600, Japan Society of Applied Physics (44):
[38] In-situ observation of the microstructural evolution in germanium under the low-energy helium ion irradiation
Arakawa, K
Tsukamoto, T
Tadakuma, K
Yasuda, K
Ono, K
JOURNAL OF ELECTRON MICROSCOPY, 1999, 48 (04): : 399 - 405
[39] DEFECTS ON GERMANIUM SURFACES CLEAVED IN HELIUM
ZHARKIKH, YS
LYSOCHENKO, SV
MOROZ, VI
SOVIET PHYSICS SEMICONDUCTORS-USSR, 1982, 16 (03): : 338 - 339
[40] DIFFUSION OF HELIUM IN SILICON GERMANIUM + DIAMOND
LUTHER, LC
MOORE, WJ
JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (04): : 1018 - &

← 1 2 3 4 5 →