POSTDEPOSITION ANNEALING EFFECTS IN RF REACTIVE MAGNETRON SPUTTERED INDIUM TIN OXIDE THIN-FILMS

被引：26
|
作者：
MARTINEZ, MA
HERRERO, J
GUTIERREZ, MT
机构：
[1] Instituto de Energías Renovables (CIEMAT), 28040 Madrid
来源：
SOLAR ENERGY MATERIALS AND SOLAR CELLS | 1992年 / 26卷 / 04期
关键词：
D O I：
10.1016/0927-0248(92)90050-Y
中图分类号：
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号：
0807 ; 0820 ;
摘要：
Indium tin oxide films have been grown by RF reactive magnetron sputtering. The influence of the deposition parameters on the properties of the films has been investigated and optimized, obtaining a value for the figure of merit of 6700 (OMEGA-cm)-1. As-grown indium tin oxide films were annealed in vacuum and O2 atmosphere. After these heat treatments the electro-optical properties were improved, with values for the resistivity of 1.9 X 10(-4)-OMEGA-cm and the figure of merit of 26700 (OMEGA-cm)-1.
引用
收藏
页码：309 / 321
页数：13
相关论文
共 50 条
  • [21] Influences of sputtering power and substrate temperature on the properties of RF magnetron sputtered indium tin oxide thin films
    Terzini, E.
    Nobile, G.
    Loreti, S.
    Minarini, C.
    Polichetti, T.
    Thilakan, P.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (6 A): : 3448 - 3452
  • [22] POSTDEPOSITION ANNEALING OF RF-SPUTTERED ZINC-OXIDE FILMS
    BEKMAN, HHPT
    BENOIST, KW
    JOPPE, JL
    APPLIED SURFACE SCIENCE, 1993, 70-1 : 347 - 350
  • [23] PROPERTIES OF RF MAGNETRON SPUTTERED THIN TIN FILMS
    SOLT, K
    HELVETICA PHYSICA ACTA, 1986, 59 (6-7): : 1024 - 1024
  • [24] EFFECT OF ANNEALING ON ELECTRICAL AND OPTICAL-PROPERTIES OF RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS
    WU, WF
    CHIOU, BS
    APPLIED SURFACE SCIENCE, 1993, 68 (04) : 497 - 504
  • [25] GROWTH AND STRUCTURE OF rf SPUTTERED INDIUM TIN OXIDE THIN FILMS.
    Sreenivas, K.
    Mansingh, Abhai
    1600, (22-23):
  • [26] Effect of annealing on the properties of RF sputtered indium molybdenum oxide thin films
    Elangovan, E.
    Martins, R.
    Fortunato, E.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (19-25) : 2831 - 2838
  • [27] RF MAGNETRON SPUTTERED TUNGSTEN CARBIDE THIN-FILMS
    SRIVASTAVA, PK
    VANKAR, VD
    CHOPRA, KL
    BULLETIN OF MATERIALS SCIENCE, 1986, 8 (03) : 379 - 384
  • [28] PROPERTIES OF INDIUM TIN OXIDE THIN-FILMS PREPARED BY REACTIVE EVAPORATION
    HABERMEIER, HU
    THIN SOLID FILMS, 1981, 80 (1-3) : 157 - 160
  • [29] PROPERTIES OF TIN DOPED INDIUM OXIDE THIN-FILMS PREPARED BY MAGNETRON SPUTTERING
    RAY, S
    BANERJEE, R
    BASU, N
    BATABYAL, AK
    BARUA, AK
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) : 3497 - 3501
  • [30] Postdeposition annealing on RF-sputtered SrTiO3 thin films
    Bayrak, Turkan
    Kizir, Seda
    Kahveci, Enver
    Biyikli, Necmi
    Goldenberg, Eda
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (02):
12345