Influences of sputtering power and substrate temperature on the properties of RF magnetron sputtered indium tin oxide thin films

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作者
Terzini, E. [1 ]
Nobile, G. [1 ]
Loreti, S. [1 ]
Minarini, C. [1 ]
Polichetti, T. [1 ]
Thilakan, P. [2 ]
机构
[1] ENEA Centro Ricerche, Localitaá Granatello, 80055 Portici (NA), Italy
[2] ENEA/ICTP TRIL Prog.-ENEA Ctro. Ric., Localitaá Granatello, 80055 Portici (NA), Italy
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10.1143/jjap.38.3448
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页码:3448 / 3452
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