RF MEASUREMENTS AND CHARACTERIZATION OF HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS AT LOW-TEMPERATURES

被引:6
|
作者
BROCKERHOFF, W [1 ]
MESCHEDE, H [1 ]
PROST, W [1 ]
HEIME, K [1 ]
WEIMANN, G [1 ]
SCHLAPP, W [1 ]
机构
[1] DEUTSCH BUNDESPOST FTZ,FORSCHUNGSINST,D-6100 DARMSTADT,FED REP GER
关键词
D O I
10.1109/22.32221
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1380 / 1388
页数:9
相关论文
共 50 条
  • [1] DC-CHARACTERIZATION AND RF-CHARACTERIZATION OF CONVENTIONAL AND SUPERLATTICE HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS AT LOW-TEMPERATURES
    BROCKERHOFF, W
    PROST, W
    MESCHEDE, H
    KRAUS, J
    HEIME, K
    WEIMANN, G
    SCHLAPP, W
    SOLID-STATE ELECTRONICS, 1990, 33 (11) : 1393 - 1400
  • [2] EFFECT OF LOW-TEMPERATURES ON NOISE PARAMETERS OF FIELD-EFFECT TRANSISTORS
    IVANOV, NI
    LOBANOV, KB
    CRYOGENICS, 1977, 17 (04) : 243 - 244
  • [3] TRANSIENT IV CHARACTERISTICS OF MOS FIELD-EFFECT TRANSISTORS AT LOW-TEMPERATURES
    PONOMARYOV, AM
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII RADIOELEKTRONIKA, 1987, 30 (01): : 78 - 79
  • [4] Low-frequency noise in GaN/AlGaN heterostructure field-effect transistors at cryogenic temperatures
    Rumyantsev, SL
    Deng, Y
    Borovitskaya, E
    Dmitriev, A
    Knap, W
    Pala, N
    Shur, MS
    Levinshtein, ME
    Khan, MA
    Simin, G
    Yang, J
    Hu, X
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (08) : 4726 - 4730
  • [5] PECULIARITIES OF THE FIELD-EFFECT IN THIN SPECIMENS AT LOW-TEMPERATURES
    YEROSOV, YI
    KLIMOVSKAYA, AI
    UKRAINSKII FIZICHESKII ZHURNAL, 1982, 27 (01): : 59 - 64
  • [6] PEAKED STRUCTURE IN FIELD-EFFECT MOBILITY OF SILICON MOS-TRANSISTORS AT VERY LOW-TEMPERATURES
    PALS, JA
    HECK, WJJAV
    APPLIED PHYSICS LETTERS, 1973, 23 (10) : 550 - 552
  • [7] ORGANIC HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS
    DODABALAPUR, A
    KATZ, HE
    TORSI, L
    HADDON, RC
    SCIENCE, 1995, 269 (5230) : 1560 - 1562
  • [8] MgZnO/ZnO Heterostructure Field-Effect Transistors Fabricated by RF-Sputtering
    Cheng, I-Chun
    Wang, Bo-Shiung
    Hou, Hsin-Hu
    Chen, Jian-Zhang
    THIN FILM TRANSISTORS 11 (TFT 11), 2012, 50 (08): : 83 - 93
  • [9] Performance of AlGaN/GaN heterostructure field-effect transistors at higher ambient temperatures
    Florovic, Martin
    Kordos, Peter
    Donoval, Daniel
    Gregusova, Dagmar
    Kovac, Jaroslav
    JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS, 2008, 59 (01): : 53 - 56
  • [10] PROPERTIES OF P-TYPE HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS AT CRYOGENIC TEMPERATURES
    REEMTSMA, JH
    MESCHEDE, H
    BROCKERHOFF, W
    HEIME, K
    SCHLAPP, W
    WEIMANN, G
    SURFACE SCIENCE, 1990, 228 (1-3) : 472 - 475