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JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA

被引：137
|
作者：
GREINER, HJ
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 12期
关键词：
D O I：
10.1063/1.1659906
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：5151 / &
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