RFI-EMI FROM RF-INDUCED GAS DISCHARGES USED FOR SPUTTER DEPOSITION AND SPUTTER ETCHING

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作者：
LAMONT, LT
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来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期
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D O I：
10.1116/1.569580
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O59 [应用物理学];
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页码：318 / 318
页数：1
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