JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA

被引：137

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作者：

GREINER, HJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 12期

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D O I：

10.1063/1.1659906

中图分类号：

O59 [应用物理学];

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页码：5151 / &

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