STEP COVERAGE OF RF-DIODE-SPUTTERED SIO2-FILMS

被引：3
|
作者：
SERIKAWA, T
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 02期
关键词：
Compendex;
D O I：
10.1116/1.570519
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
SILICA
引用
收藏
页码：582 / 586
页数：5
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