PRODUCTION AND ANNEALING OF COLOR CENTERS IN RF SPUTTERED SIO2 FILMS

被引：36
|
作者：
HICKMOTT, TW
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 06期
关键词：
D O I：
10.1063/1.1660577
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2543 / &
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