MICROSTRUCTURING OF PHOTOMASKS BY A NON-REACTIVE RADIO-FREQUENCY ION ETCHING

被引：3
|
作者：
SPANGENBERG, B [1 ]
GORANCHEV, BG [1 ]
ORLINOV, VI [1 ]
JELEV, JG [1 ]
机构：
[1] INST SEMICOND COMPONENTS,BOTEVGRAD,BULGARIA
来源：
THIN SOLID FILMS | 1982年 / 87卷 / 04期
关键词：
D O I：
10.1016/0040-6090(82)90285-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：313 / 322
页数：10
相关论文
共 50 条
  • [1] RADIO-FREQUENCY REACTIVE SPUTTER ETCHING CONTROL OF ETCH RATES
    HORWITZ, CM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (03): : 840 - 843
  • [2] Diamond Microstructuring by Deep Anisotropic Reactive Ion Etching
    Golovanov, Anton V.
    Bormashov, Vitaly S.
    Luparev, Nikolay V.
    Tarelkin, Sergey A.
    Troschiev, Sergey Y.
    Buga, Sergei G.
    Blank, Vladimir D.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2018, 215 (22):
  • [3] RADIO-FREQUENCY ION ETCHING OF ERYTHROCYTE SURFACES - CHANGES OCCURRING DURING EARLY ETCHING
    FRISCH, B
    LEWIS, SM
    STUART, PR
    OSBORN, JS
    MICRON, 1975, 6 (3-4) : 101 - 110
  • [4] CHARACTERIZATION OF A REACTIVE BROAD BEAM RADIO-FREQUENCY ION-SOURCE
    LOSSY, R
    ENGEMANN, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 284 - 287
  • [5] The modelling of radio frequency hydrogen plasmas in the reactive ion etching of GaAs
    Layberry, RL
    Pearce, CG
    Sullivan, JL
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (23) : 3187 - 3196
  • [6] Microstructuring of glassy carbon: comparison of laser machining and reactive ion etching
    Kuhnke, M
    Lippert, T
    Ortelli, E
    Scherer, GG
    Wokaun, A
    THIN SOLID FILMS, 2004, 453 : 36 - 41
  • [7] Ion-induced etching of organic polymers in argon and oxygen radio-frequency plasmas
    Baggerman, J.A.G.
    Visser, R.J.
    Collart, E.J.H.
    1600, (75):
  • [8] EFFECTS OF FREQUENCY ON OPTICAL-EMISSION, ELECTRICAL, ION, AND ETCHING CHARACTERISTICS OF A RADIO-FREQUENCY CHLORINE PLASMA
    DONNELLY, VM
    FLAMM, DL
    BRUCE, RH
    JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) : 2135 - 2144
  • [9] SIMPLIFIED RADIO-FREQUENCY ION SOURCE
    ALLISON, SK
    NORBECK, E
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1956, 27 (05): : 285 - 288
  • [10] Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Frequency Source
    Dai Zhongling
    Yue Guang
    Wang Younian
    PLASMA SCIENCE & TECHNOLOGY, 2012, 14 (03) : 240 - 244
12345