MICROSTRUCTURING OF PHOTOMASKS BY A NON-REACTIVE RADIO-FREQUENCY ION ETCHING

被引：3
|
作者：
SPANGENBERG, B [1 ]
GORANCHEV, BG [1 ]
ORLINOV, VI [1 ]
JELEV, JG [1 ]
机构：
[1] INST SEMICOND COMPONENTS,BOTEVGRAD,BULGARIA
来源：
THIN SOLID FILMS | 1982年 / 87卷 / 04期
关键词：
D O I：
10.1016/0040-6090(82)90285-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：313 / 322
页数：10
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